RTA System

The rapid temperature annealing system (RTA) is used for the processing of semiconductor wafers by rapid thermal heating up or annealing from ultra-high vacuum to ambient pressure conditions with different atmospheres like oxygen and nitrogen. Clean, simple and rugged design for compatibility with today's semiconductor processing technologies. Several unique features guarantee excellent uniformity and process reproducibility.

More technical specification can be found in the data sheet below


Available Downloads:

Data Sheet - RTA System