EBE - AX
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Specifications
The Electron Beam Evaporator - AX (EBE-AX) is designed for use in MBE systems to generate thin films on substrates through vapor deposition. This deposition technique is typically operated in a vacuum range from 1x10-11 to 1x10-5 mbar and allows an efficient material utilization relative to other methods, which yields a high deposition rate from 0,1µm/min to 100µm/min at low substrate temperatures. The film thickness can be controlled by a rate monitor and a shutter. The sublimation is realized through direct electron bombardment of the deposition material without heating up the whole crucible. The electrons are extracted from a tungsten filament through VDC-annealing and accelerated towards the deposition material by means of high voltage in combination with a magnetic deflection of the electron beam. The process is a form of physical vapor deposition (PVD). Furthermore a water cooling system tempers the crucible holder.
Options:
- Unit for vacuum isolation
TYPE | EBE-AX |
TEMPERATURE RANGE | up to 2700 °C |
HEATING SYSTEM | direct e-beam bombardment (electrons extracted from W-filament and accelerated to the crucible by magnetic deflection) |
BAKE-OUT TEMPERATURE | 200 °C |
FLANGE SIZE | DN 63 | 100 (others on request) |
MAX. OUTER DIAMETER | 60 mm (others on request) |
MIN. UHV LENGTH | 240 mm |
EVAPORATION FROM | 4 cc | 5 cc crucible |
COOLING | integrated water cooling |
MAX. BEAM POWER | 4 kV (0,5 A at 8 kV) |
PRIMARY BEAM DEFLECTION | 100 mA |
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